NPR9730T (Single-Layer Positive Resist) · BLX-210 (Under Layer for Bi-Layer Process)
Enabling flexible profile control and low-temperature bake processing — optimized for easy lift-off.
In addition to single-layer positive resists, we offer a wide range of bi-layer resist options suited for fine-line patterning. Compared to conventional products, our bi-layer process offers the advantages of low-temperature baking and simplified undercut control.
Table of Contents
NAGASE Lift-Off Photoresists
More Than Two Decades of Manufacturing & Development Expertise
Nagase ChemteX has built a broad portfolio of core technologies through many years of hands-on experience in resist development. These technologies are combined and applied in response to evolving market needs to drive ongoing product innovation.
Our products — developed with a focus on consistent, reliable quality — have supported numerous customers both in Japan and internationally, earning strong recognition across the industry.
Product Lineup
Nagase ChemteX's lift-off photoresist lineup includes two series: the NPR9700 series (single-layer positive resist) and the BLX series (under layer material for bi-layer process).
Single-Layer Positive Resist — NPR9730T
- Positive Resist for Lift-Off Process
-
Top and bottom linewidths can be adjusted by varying process conditions
-
Exposure wavelength range: g-line to i-line (broadband compatible)
-
Easily forms a retrograde profile without special processing
-
Easy resist removal
-
Film thickness, linewidth, and profile can be customized to meet customer requirements
Under Layer Resist for Bi-Layer Process — BLX-210
-
Low-temperature bake (no interlayer mixing at bake temperatures below 140°C)
-
Easy resist removal
-
Enables finer patterning than single-layer lift-off resists
-
Low dispense volume — good coatability with excellent in-plane uniformity
-
Fewer defects (low solvent volatility suppresses particle generation during coating)
-
Easy undercut control
-
Good edge bead removal (EBR) performance
-
No interlayer mixing — compatible with most upper-layer resists
Bi-Layer Pattern Profile — Pre-Bake Temperature Dependence
Up to 160°C, the amount of undercut can be controlled by adjusting the pre-bake temperature.
|
Bottom layer thickness |
0.2μm |
|---|---|
|
Pre-bake |
Contact bake |
|
Exposure dose |
300 mJ/cm² |
|
Development conditions |
2.38% TMAH, 23°C, 60 s, single puddle |
|
Pattern size |
0.5 μm trench |
Bi-Layer Pattern Profile — Development Time Dependence
The undercut amount can be controlled by adjusting the development time, up to approximately 70 seconds.
|
Bottom layer thickness |
0.2μm |
|---|---|
|
Pre-bake temperature |
145°C, proximity bake |
|
Exposure dose |
300mJ/cm2 |
|
Pattern size |
0.5 μm trench |
What NAGASE Offers
Drawing on many years of experience in resist material development, we deliver the precise resist profile each customer needs, tailored process by process. In particular, we offer a wide range of products with ideal properties for the lift-off process.
Services (Examples)
|
Small-Lot Production |
We accommodate orders ranging from R&D quantities to full mass-production volumes. Please contact us to discuss your specific requirements. |
|---|---|
|
Viscosity Adjustment |
Resist viscosity can be customized to match your coating equipment and process conditions. |
|
Process Engineering Support |
Leveraging extensive mass-production experience in the electronics industry, we offer formulation development and product customization tailored to your specific process. |
Application Examples
Manufacturer: Nagase ChemteX Corporation
Nagase ChemteX has evolved into a unique specialty chemical manufacturer with leading market share across many fields, driven by core strengths in synthesis and formulation technologies.
Our products are applied across a wide range of fields including chemicals, electronics, automotive, and aerospace. In the electronics sector, the company maintains production facilities not only in Japan but also in China and the United States, meeting customers' requirements for local production.
Company Overview — Nagase ChemteX Corporation
|
Company Name |
Nagase ChemteX Corporation |
|---|---|
|
Head Office |
1-1-17 Shinmachi, Nishi-ku, Osaka 550-8668, Japan |
|
Established |
April 1, 1970 |
|
Number of Employees |
Approx.580 (FY2025) |
|
Business Activities |
Development and manufacture of high-performance resins (epoxy-modified products), photolithography materials, epichlorohydrin derivatives, conductive coatings, and functional dyes |
|
URL |
Corporate Website https://group.nagase.com/nagasechemtex/en/ Lift-Off Photoresist Site |
Distributor: Nagase & Co., Ltd.
Nagase & Co., Ltd. is a specialty chemicals trading company founded in Kyoto in 1832. Securing exclusive distribution rights for world-class products in Japan, the company has leveraged its technical expertise, market intelligence, and global network to expand into manufacturing, processing, and R&D — steadily evolving its business model.
As the company marks its 200th anniversary in 2032, and looks even further ahead, Nagase remains committed to building a society where people can live in comfort, safety, and security.
Company Overview — Nagase & Co., Ltd.
|
Company Name |
Nagase & Co., Ltd. |
|---|---|
|
Tokyo Head Office |
Tokiwabashi Tower, 2-6-4 Otemachi, Chiyoda-ku, Tokyo 100-8142, Japan |
|
Osaka Head Office |
1-1-17 Shinmachi, Nishi-ku, Osaka 550-8668, Japan |
|
Established |
December 9, 1917 |
|
Employees |
975 (Consolidated: 7,528) |
|
Business Activities |
Export, import, and domestic sales of chemicals, synthetic resins, electronic materials, cosmetics, health foods, and related products |
|
URL |
Corporate Website |
FAQ
- QCan you provide samples?
- A
Yes, product samples are available. We will confirm your detailed process conditions and recommend the most appropriate material.
- QWhat are the recommended process conditions?
- A
We select materials based on each customer's individual process conditions. Please contact us directly for a consultation.
- QWhat is the lead time?
- A
Evaluation samples can typically be delivered within approximately one month.
- QHow stable is BLX when stored at room temperature?
- A
No quality degradation occurs even after 12 months of storage. However, our standard recommended shelf life is 6 months.
- QWhere is the product currently in use?
- A
The product is used by customers in Japan and internationally for fine-patterning processes in RF modules for 5G base stations and SAW filters for smartphones — applications experiencing rapidly growing demand. It also has a proven track record in processing steps for automotive communication sensors, where high reliability is critical.
- QIs post-exposure bake (PEB) required?
- A
PEB is not required; however, we can provide guidance based on your evaluation results if needed.
- QWhat exposure dose is required? (NPR9700 series)
- A
Sensitivity can be tuned to your requirements. As a reference example, approximately 40 mJ/cm² is required at a film thickness of 1.2 μm. This may vary depending on your equipment and evaluation results.
- QIs substrate surface pretreatment required?
- A
It depends on the substrate condition, but in general, pretreatment is not required.